Gasboard-2060 NDIR SiF₄ Gas Sensor
Semiconductor Process Gas Analyzers

Gasboard-2060

NDIR SiF₄ Gas Sensor

Model
Gasboard-2060
Category
Gas Analyzers › Semiconductor Process Gas Analyzers

Parameters: SiF4

IndustriesSemiconductor
Measurement PrincipleNDIR

Overview

Gasboard-2060 is an NDIR SiF4 sensor for real-time endpoint detection (EPD) of chamber cleaning in silicon-based CVD deposition chambers. Tracking SiF4 concentration lets operators end cleaning at the right moment, cutting cleaning time and gas use and reducing chamber wear. Its modular design with analog and digital outputs simplifies integration and maintenance.

Key Features

  • NDIR technology for high sensitive and accurate SiF4 measurement.
  • Fast response for precise deposition chamber cleaning endpoint determination.
  • Low zero drift and high repeatibility for consistent measurement performance.
  • Modular design for easy system integration.
  • Analog and digital communication outputs.

Measured Parameters

ParameterMeasuring Range
SiF4absorbance 0.0~0.2

Specifications

Measurement 1SiF4
Detection PrincipleNDIR
Range 2 3 4(0.0-0.2) Absorbance
Response Time 5T90<2s
Data Reporting Rate0.5s
Analog Output1-10VDC
Power Input15VDC (≤300mA), 24VDC
Digital CommunicationRS232
Sampling PortKF16
Dimensions200×120×75.5mm
Leak Rate<1×10-8 Pa·m3/s (He)
Operating Temperature(5~65) ℃

Applications

  • Semiconductor CVD chamber cleaning endpoint detection (EPD)