
Process Gas Analyzers
GasTDL-3100 Single Ended
Single Ended In-situ TDLAS Gas Analyzer
- Model
- GasTDL-3100 Single Ended
- Category
- Gas Analyzers › Process Gas Analyzers
Parameters: O2, CO, CO2, CH4
IndustriesIndustrial Process
Measurement PrincipleTDLAS
Overview
The single-ended GasTDL-3100 is an in-situ TDLAS analyzer for real-time O2, CO, CO2 and CH4 measurement without sampling or conditioning. An internal reference cell locks the laser to the absorption line for stability, and the single-ended design needs no optical alignment—suited to oil and gas, chemical, metallurgy and power plants.
Key Features
- Highly Selective TDLAS Technology: Accurate target gas measurement without cross-interference from background gases.
- Direct In-Situ Gas Measurement: No sampling or gas conditioning systems required, enabling fast real-time analysis.
- Built-in Reference Gas Cell: Continuous locking of the laser to the target absorption line for long-term measurement stability.
- Single-Ended Design: No optical path alignment required, simplifying installation and commissioning.
- Rugged Industrial Construction: Reliable operation in harsh environments with high temperature, heavy dust, and corrosive gases.
Measured Parameters
| Parameter | Measuring Range |
|---|---|
| O2 | To be confirmed |
| CO | To be confirmed |
| CO2 | To be confirmed |
| CH4 | To be confirmed |
Specifications
| Measuring Components | O2, CO, CO2, CH4* |
|---|---|
| Measuring Principle | TDLAS |
| Measurement Range | O2: 0~2%VOL (range can be customized) |
| Accuracy | ≤±1%F.S. |
| Response Time | <1s |
| Repeatability | ≤±1% |
| Span Drift | ≤±1%F.S. |
| Resolution | 0.01%VOL |
| Explosion-proof Rating | Ex db IIC T6 Gb / Ex tb IIIC T80℃ Db |
| Ambient Temperature | -20~60℃ |
| Operating Power | 24V DC |
| Operating Gas | 0.3~0.8MPa Industrial Nitrogen |
| Communication Interface | RS-485, RS-232 |
| Output Mode | 2 Channels of 4~20mA Output / 3 Channels of Relay Output |
Applications
- Oil and gas
- Chemical
- Metallurgy
- Power and energy
- Safety monitoring and process optimization
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